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The effect of electromechanical coupling on the strain in AlGaN/GaN heterojunction field effect transistors

机译:机电耦合对alGaN / GaN应变的影响   异质结场效应晶体管

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摘要

The strain in AlGaN/GaN heterojunction field-effect transistors (HFETs) isexamined theoretically in the context of the fully-coupled equation of statefor piezoelectric materials. Using a simple analytical model, it is shown that,in the absence of a two-dimensional electron gas (2DEG), the out-of-planestrain obtained without electromechanical coupling is in error by about 30% foran Al fraction of 0.3. This result has consequences for the calculation ofquantities that depend directly on the strain tensor. These quantities includethe eigenstates and electrostatic potential in AlGaN/GaN heterostructures. Itis shown that for an HFET, the electromechanical coupling is screened by the2DEG. Results for the electromechanical model, including the 2DEG, indicatethat the standard (decoupled) strain model is a reasonable approximation forHFET calculataions. The analytical results are supported by a self-consistentSchr\"odinger-Poisson calculation that includes the fully-coupled equation ofstate together with the charge-balance equation.
机译:理论上,在压电材料的全耦合状态方程的背景下,对AlGaN / GaN异质结场效应晶体管(HFET)的应变进行了研究。使用简单的分析模型表明,在不存在二维电子气(2DEG)的情况下,对于Al含量为0.3的情况,在没有机电耦合的情况下获得的面外应变的误差约为30%。该结果对直接取决于应变张量的量的计算具有影响。这些数量包括AlGaN / GaN异质结构中的本征态和静电势。结果表明,对于HFET,机电耦合由2DEG屏蔽。机电模型(包括2DEG)的结果表明,标准(解耦)应变模型是HFET计算的合理近似值。分析结果由自洽的“奥丁格-泊松”计算所支持,该计算包括状态的完全耦合方程和电荷平衡方程。

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  • 作者单位
  • 年度 2003
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  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
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